Fabrication and exploring the structural and optical features of Si3N4/SiO2 hybrid nanomaterials doped PMMA for promising optoelectronics fields
Optical and Quantum Electronics 56 (8), 1308, 2024
Authors
Researchers on Platform
More by this author
Fabricating and controlling the morphological, microstructure and optical features of (CS-PVA-WC-SiO<sub>2</sub>) promising films for nanoelectronics devices and optical applications
Interfacial polarization in PMMA/SiC-NiO hybrid nanocomposites with enhanced dielectric and mechanical performance for flexible electronic applications
Fabrication and Enhanced Features for PVA-MC-SrTiO3-SiO2 New Nanostructures for Optical Devices and Electronics Applications
Enhancement of spectroscopic and dielectric behavior of poly-methyl methacrylate-polyvinylpyrrolidone-silicon oxide-tungsten oxide new hybrid films for advanced optoelectronics applications
Manufacturing and Controlling the Microstructural, Optical and Dielectric Features of PS-PEG/SiO2-Sb2O3 Promising Films for Pressure Sensors and Flexible Optoelectronics Applications